Application In situ one side or double side metal coating.
Deposition materials Metal materials- Ag, Cu, Ni, Ti,…
Substrate size Piece to 4 inch, Rectangular type
Product yield Depending on sample size
Sputter gun size Small to 800mm*150mm*10mm(T)
No. of sputter gun Up to 4 nos
Plasma power RF, DC or Pulsed DC power
Pressure control Auto pressure control (throttle valve and baratron gauge)
Process gases Ar, O2, N2
Vacuum pump TMP, Cryo pump or Diffusion pump + Rotary pump or Dry pump
Ultimate pressure < 5.0E-7 Torr
Option Double site metal coating, Plasma cleaning
Control PC control (UPRO software) or Manual