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SPUTTER
SPUTTER
DRY ETCHER
PECVD
ALD
E beam evaporator
Thermal Evaporator
Glovebox+PVD
2D material CVD
LPCVD & Furnace
Vacuum Sintering Furnace
RTP
Plasma Doping (PDS)
ASHER
Wet bench
Crystal Si solarcell
SPUTTER
DRY ETCHER
PECVD
ALD
E beam evaporator
Thermal Evaporator
Glovebox+PVD
2D material CVD
LPCVD & Furnace
Vacuum Sintering Furnace
RTP
Plasma Doping (PDS)
ASHER
Wet bench
Crystal Si solarcell
SPUTTER
DRY ETCHER
PECVD
ALD
E beam evaporator
Thermal Evaporator
Glovebox+PVD
2D material CVD
LPCVD & Furnace
Vacuum Sintering Furnace
RTP
Plasma Doping (PDS)
ASHER
Wet bench
Crystal Si solarcell
SPUTTER
PRODUCT
INTRODUCTION
Process Data
SEM Results
Target Material : RuO2
Sample size : 4 ”
R.F power : 200W
Working Pressure : 7mTorr
Gas : Ar flow
Gun : 4 inch
Cu under 5mTorr Ar @ 100W, 1 min.
Rms rough
Ave rough
Median Ht
Mean Ht
Surface area
Volume
7.2099Å
4.8465Å
28.35Å
27.771Å
20.183㎛2
0.056024㎛2
MOON series (Cu & Ag SEM images )
PZT target process data
Process condition
Target material : PZT
Ar : 25sccm
W/P : 5mTorr
Power : RF 100W
Temp : R.T
TERRA – P
TERRA – P
TERRA – T
TERRA – T
TERRA – R
TERRA – R
TERRA – C
TERRA – C
TERRA-MOON
TERRA-MOON
1
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COMPANY
Overview
History
Certification Status
Product Application
Contact Us
PRODUCT
SPUTTER
DRY ETCHER
PECVD
ALD
E beam evaporator
Thermal Evaporator
Glovebox+PVD
2D material CVD
LPCVD & Furnace
Vacuum Sintering Furnace
RTP
Plasma Doping (PDS)
ASHER
Wet bench
Crystal Si solarcell
RECRUIT
Type of Talent
Recruitment Guide
Recruitment Bulletin
PARTNERSHIP
Partnership
SUPPORT
Notice
Consultation Inquiry
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