PRODUCT
2D material CVD
GRABO-Bench
SPECIFICATIONS
| Application | WS2, MoS2, Graphene,… |
|---|---|
| Substrate size & Load capacity | 20mm×20mm & 1sample/run |
| Process chamber | Q’tz tube Q’tz sheath for profile thermocouple SUS manifold with double inlet rods for gas inlet and profiling T/C EP treated SUS flange with water cooling |
| Heating source | Temperature range : Max. 1,000℃ Tungsten-Halogen lamp & lamp heater SUS heater housinte chamber & water cooling Heater temperature controller |
| Gas(MFC) | Ar, H2, CH4, O2,..etc |
| Pump | Rotary pump |
| Control | Manual control or PC |
| System dimension | 1,200mm(W)×600(D)×1,250(H) |