PRODUCT
Wet bench
AquaChem
SPECIFICATIONS
| Application | RCA Cleaning Bench Etching Bench Develop Bench Solvent Bench Si wet etch Membrane & Micro channel formation V -Groove |
|---|---|
| Product Sample | Si, Sapphire, Glass, Ceramic, etc. |
| Substrate Size | Piece to Max. 8 inch |
| Wafer handle | Cassette type |
| Chemical Bath | PTFE, Quartz or SUS316L |
| Chemical heating | Max. 150℃ |
| Sonic | Ultrasonic or Megasonic |
| QDR | N2 bubble, DI shower, overflow |
| Option | Chemical circulation Cassette agitator LCSS(Local Chemical Supply System) Auto fire extinguisher DI generator Wet scrubber Wafer and Cassette dryer |
| Control | PC control or Manual control |