PRODUCT

Wet bench

AquaChem-IN

SPECIFICATIONS

Application RCA Cleaning
Etching
Develop
Solvent
Product Sample Glass, Si wafer, Ceramic,…
Substrate Size Max. 5G
Wafer handle Single substrate or Cassette type
Chemical Zone
Chemical circulation & Tank PTFE, Quartz, PP or SUS316L
Chemical heating Max. 80℃
Guide roller speed Adjustable
DI spray shower zone
Air Knife zone Up and down site
Option LCSS(Local Chemical Supply System)
Auto fire extinguisher
DI generator
Wet scrubber
Control PC control or PLC control