PRODUCT
Wet bench
AquaChem-IN
SPECIFICATIONS
Application | RCA Cleaning Etching Develop Solvent |
---|---|
Product Sample | Glass, Si wafer, Ceramic,… |
Substrate Size | Max. 5G |
Wafer handle | Single substrate or Cassette type |
Chemical Zone | |
Chemical circulation & Tank | PTFE, Quartz, PP or SUS316L |
Chemical heating | Max. 80℃ |
Guide roller speed | Adjustable |
DI spray shower zone | |
Air Knife zone | Up and down site |
Option | LCSS(Local Chemical Supply System) Auto fire extinguisher DI generator Wet scrubber |
Control | PC control or PLC control |