PRODUCT
Glovebox+PVD
GlovePV-R
SPECIFICATIONS
| Application | Alq3, CuPc, NPD, LiF, C60, BCP, PbI2, MAI, Ag, SnO2, MoO,WO, NiO,.. Al, Au, Ag,… |
|---|---|
| Substrate size & Load capacity | 200mm×200mm & 1sample/run |
| Process chamber | Organic Chamber Metal Chamber Perovskite Chamber Glovebox |
| Substrate rotation | 0 to 20 rpm |
| Substrate holder | Rotation and heating |
| No of effusion cell | 2 to 6ea, Middle temperature 650℃ |
| No of boats | 2 to 6 ea |
| Thickness controller | Q’tz crystal sensor & controller |
| Ultimate pressure | < 5.0E-7 Torr (Cryo pump or TMP) |
| Option | Co-evaporation, |
| Control | Manual control or PC control |